Research Outline
Emission min measurement of various process plasmas
We have been developing luminescence min measurements of electron temperature, density, energy min function, gas temperature, and radical density for various low-temperature non-equilibrium plasmas based on the atomic min. We are developing a wide range of plasma measurements, including spatial min tomography, for a wide variety of plasma sources, such as semiconductor etching processes and medical and dental plasma sources, as well as for practical applications.
［Electronic engineering] Decompression process plasma for dry etching, silicon thin film preparation for plasma photovoltaic devices.
［Medical engineering: Atmospheric pressure and low-temperature plasma for dental applications such as cosmetic dentistry and dentistry, and medical applications such as hemostasis and dermatology.
［Nuclear engineering] Underwater arc plasma for decommissioning of nuclear reactors
［Nuclear fusion] Divertor-simulated low-temperature plasma in the vicinity of nuclear fusion reactors
［Environmental Engineering] Nitrogen and oxygen plasma for simulating atmospheric environments, carbon dioxide plasma for CO2 reuse
［Materials Science and Engineering: Non-equilibrium plasma for antireflection coating of optical elements, nitrogen-containing plasma for nitriding of metal surfaces.
［Mechanical Engineering] Automobile engine combustion flame plasma
［Aerospace] Electric propulsion thruster plasma for satellites, etc.