Research Outline
Emission of light from various process plasmas minOptical Measurement
minWe are developing optical measurements of electron temperature, density, energy mindistribution function, gas temperature, and radical density for various low-temperature non-equilibrium plasmas based on the atomic minprocesses. minWe are developing a wide range of plasma measurement techniques for semiconductor etching processes, medical and dental plasma sources, etc., including spatial mintomography measurements.
［Electronic engineering] Decompression process plasma for dry etching, silicon thin film preparation for plasma photovoltaic devices.
［Medical engineering: Atmospheric pressure and low-temperature plasma for dental applications such as cosmetic dentistry and dentistry, and medical applications such as hemostasis and dermatology.
［Nuclear engineering] Underwater arc plasma for decommissioning of nuclear reactors
［Nuclear fusion] Divertor-simulated low-temperature plasma in the vicinity of nuclear fusion reactors
［Environmental Engineering] Nitrogen and oxygen plasma for simulating atmospheric environments, carbon dioxide plasma for CO2 reuse
［Materials Science and Engineering: Non-equilibrium plasma for antireflection coating of optical elements, nitrogen-containing plasma for nitriding of metal surfaces.
［Mechanical Engineering] Automobile engine combustion flame plasma
［Aerospace] Electric propulsion thruster plasma for satellites, etc.